1. Overview
The development of ultrafine particles, especially nano-particles, has become a hot field in the current high-tech, and has been widely used in the fields of materials, chemical industry, light industry, metallurgy, electronics, and biomedicine. There are a variety of methods for the preparation of ultrafine particles, supercritical fluid deposition technology as a high-tech, can more accurately control the crystallization process, can produce a small average particle size of fine particles, but also can control the distribution of its particle size, so from the supercritical solution deposition is a very promising new technology.
There are many kinds of supercritical fluid deposition technology, of which two are the most prominent: the first: the rapid expansion process of supercritical solution (code RESS); the second: gas anti solvent crystallization process (code GAS).
Main technical parameters of 2.
1. Filter: volume 0.5L, maximum design pressure 16MPa
2. System pressure: 50MPa
3. System temperature:-5-120 ℃
4. Power supply voltage: 380V
5. Power: 4.5KW